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Chrome coatings with the aid of magnetrone ione powder coatingTODOROVA, S; DOCHEV, D; KYNEV, M et al.1985, Vol 34, Num 11, pp 505-507, issn 0025-455XArticle

Recent advances in sputter deposition = Progrès récents dans le dépôt par pulvérisationTHORNTON, J. A.Surface engineering. 1986, Vol 2, Num 4, pp 283-292, issn 0267-0844Article

Multiferroic properties and magnetoelectric coupling in highly textured Pb(Fe_0.5Nb_0.5)O₃ thin films obtained by RF sputteringRAYMOND, Oscar; OSTOS, Carlos; FONT, Reynaldo et al.Acta materialia. 2014, Vol 66, pp 184-191, issn 1359-6454, 8 p.Article

Preparation and some properties of sputtered Co/U-As multilayersPLASKETT, T. S; FUMAGALLI, P; MCGUIRE, T. R et al.IEEE transactions on magnetics. 1992, Vol 28, Num 5, pp 2659-2661, issn 0018-9464, 2Conference Paper

Growth and disintegration of cones on silver surface under high fluence Xe atom bombardment = Croissance et désintégration de cônes sur une surface d'argent sous bombardement d'atomes de Xe de haute fluenceNINDI, M; STULIK, D.Radiation effects. 1988, Vol 106, Num 1-2, pp 99-106, issn 0033-7579Article

The application of a new 3S method to sputtering velocity and yield measurements = Application de la nouvelle méthode «3S» aux mesures de la vitesse et du rendement de pulvérisationKOWALSKI, Z. W.Journal of materials science letters. 1987, Vol 6, Num 10, pp 1207-1208, issn 0261-8028Article

Diffusion in molybdenum disilicideSALAMON, Marcel; MEHRER, Helmut.Zeitschrift für Metallkunde. 2005, Vol 96, Num 8, pp 833-842, issn 0044-3093, 10 p.Article

Industrial application of pulsed DC bias power supplies in closed field unbalanced magnetron sputter ion platingCOOKE, K. E; HAMPSHIRE, J; SOUTHALL, W et al.Surface engineering. 2004, Vol 20, Num 3, pp 189-195, issn 0267-0844, 7 p.Conference Paper

Microstructure and magnetic properties for highly coercive FePt sputtered films : L10-type ultra-high density magnetic recording materialsSHIMA, Toshiyuki; TAKANASHI, Koki; LI, Guo Qing et al.Materials transactions - JIM. 2003, Vol 44, Num 8, pp 1508-1513, issn 0916-1821, 6 p.Article

Some recent applications of materials deposited by unbalanced magnetron sputteringKELLY, P. J; ARNELL, R. D; AHMED, W et al.Surface engineering. 1993, Vol 9, Num 4, pp 287-291, issn 0267-0844Article

Calcul analytique de la distribution des défauts d'irradiation et d'une impureté aux doses limites d'implantation d'ionsKURGANOV, A. G; FAL'KO, G. L; FEDORCHENKO, A. M et al.Fizika metallov i metallovedenie. 1986, Vol 61, Num 1, pp 16-20, issn 0015-3230Article

Recent progress in multi-element alloy and nitride coatings sputtered from high-entropy alloy targetsCHENG, Keng-Hao; LAI, Chia-Han; LIN, Su-Jien et al.Annales de chimie (Paris. 1914). 2006, Vol 31, Num 6, pp 723-736, issn 0151-9107, 14 p.Article

Electronic and luminescence properties of sputter-deposited TiO₂ nanostructuresCHANG, Yu-Ming; MISHRA, Dillip K; TING, Jyh-Ming et al.Acta materialia. 2013, Vol 61, Num 19, pp 7511-7519, issn 1359-6454, 9 p.Article

Method to design stoichiometric deposition reactive sputtering without hysteresisFADDEEVA, S; OSEGUERA, J.Surface engineering. 2013, Vol 29, Num 7, pp 547-554, issn 0267-0844, 8 p.Article

Microstructure and strengthening mechanisms in Cu/Fe multilayersCHEN, Y; LIU, Y; SUN, C et al.Acta materialia. 2012, Vol 60, Num 18, pp 6312-6321, issn 1359-6454, 10 p.Article

Observations of anomalies in the anodic behaviour of microcrystalline aluminiumBO ZHANG; YING LI; FUHUI WANG et al.Corrosion science. 2010, Vol 52, Num 8, pp 2612-2615, issn 0010-938X, 4 p.Article

Hardness enhancement in nanocrystalline tantalum thin filmsZHANG, M; YANG, B; CHU, J et al.Scripta materialia. 2006, Vol 54, Num 7, pp 1227-1230, issn 1359-6462, 4 p.Article

Sputtering of Fe(100) due to low-energy ion bombardments : Molecular dynamics simulationKIM, Dong-Ho; DO HYUN KIM.Scripta materialia. 2006, Vol 55, Num 11, pp 1043-1046, issn 1359-6462, 4 p.Article

Improvement of Zr film purity by using a purified sputtering target and negative substrate bias voltageLIM, J.-W; BAE, J. W; ZHU, Y. F et al.Surface & coatings technology. 2006, Vol 201, Num 3-4, pp 1899-1901, issn 0257-8972, 3 p.Article

Controlled synthesis of differently textured Sm(Fe,Ti)₁₂ sputtered filmsNAVARATHNA, A; HEDGE, H; RANI, R et al.IEEE transactions on magnetics. 1992, Vol 28, Num 5, pp 2838-2840, issn 0018-9464, 2Conference Paper

Microstructural and magnetic characterization of the interfaces in DC triode sputtered metal/carbon and metallic multilayer filmsSELLA, C; KAABOUCHI, M; MILOCHE, M et al.Applied surface science. 1992, Vol 60-61, pp 781-789, issn 0169-4332Conference Paper

Energy and angular distributions of Rh atoms ejected due to ion bombardment from Rh{111}: a theoretical study = Distributions d'énergie et angulaires d'atomes Rh éjectés dus au bombardement ionique de Rh{111}: une étude théoriqueGARRISON, B. J; REIMANN, C. T; WINOGRAD, N et al.Physical review. B, Condensed matter. 1987, Vol 36, Num 7, pp 3516-3521, issn 0163-1829Article

Sputtering and surface scattering at oblique ion incidence onto crystals = Pulvérisation et diffusion de surface à l'incidence des ions oblique sur des cristauxMASHKOVA, E. S; MOLCHANOV, V. A.Radiation effects. 1987, Vol 102, Num 1-4, pp 125-141, issn 0033-7579Article

On the chemical sputtering of oxygen-exposed molybdenum = Ueber das chemische Sputtern von Sauerstoff ausgesetztem MolydbaenSAIDOH, M; GNASER, H; HOFER, W.O et al.Applied physics. A, Solids and surfaces. 1986, Vol 40, Num 4, pp 197-202, issn 0721-7250Article